Advances in Imaging and Electron Physics, Volume 226 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. Chapters in this release cover Characterization of nanomaterials properties using FE-TEM, Cold field-emission electron sources: From higher brightness to ultrafast beams, Every electron counts: Towards the development of aberration optimized and aberration corrected electron sources, and more. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.

• Provides the authority and expertise of leading contributors from an international board of authors
• Presents the latest release in the Advances in Imaging and Electron Physics

Advances in Imaging and Electron Physics, Volume 213, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.

• Contains contributions from leading authorities on the subject matter
• Informs and updates on the latest developments in the field of imaging and electron physics
• Provides practitioners interested in microscopy, optics, image processing, mathematical morphology, electromagnetic fields, electrons and ion emission with a valuable resource
• Features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing